Karen S Babich: search on Z-Library

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1

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Hardmask technology for sub-100 nm lithographic imaging

Babich, Katherina, Mahorowala, Arpan P., Medeiros, David R., Pfeiffer, Dirk, Petrillo, Karen E., Angelopoulos, Marie, Grill, Alfred, Patel, Vishnubhai, Halle, Scott, Brunner, Timothy A., Conti, Richar

Year:

2003

Language:

english

File:

PDF, 1.24 MB

english, 2003

2

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - High-resolution 248-nm bilayer resist

Lin, Qinghuang, Petrillo, Karen E., Babich, Katherina, LaTulipe, Douglas C., Medeiros, David R., Mahorowala, Arpan P., Simons, John P., Angelopoulos, Marie, Wallraff, Gregory M., Larson, Carl E., Fenz

Year:

1999

Language:

english

File:

PDF, 1.92 MB

english, 1999

3

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Impact of thin resist processes on post-etch LER

Mahorowala, Arpan P., Goldfarb, Dario L., Temple, Karen, Petrillo, Karen E., Pfeiffer, Dirk, Babich, Katherina, Angelopoulos, Marie, Gallatin, Gregg M., Rasgon, Stacy, Sawin, Herbert H., Allen, Scott

Year:

2003

Language:

english

File:

PDF, 1.29 MB

english, 2003

4

Dilemmas and directions for psychiatric nursing in the 1990s

Patricia C. Pothier, Gail W. Stuart, Kathryn Puskar, Karen Babich

Journal:

Archives of Psychiatric Nursing

Year:

1990

Language:

english

File:

PDF, 904 KB

english, 1990

5

Nursing research at NIMH: An update

Angele Barron McBride, Eleanor C. Friedenberg, Karen S. Babich, Carol T. Bush

Journal:

Archives of Psychiatric Nursing

Year:

1992

Language:

english

File:

PDF, 394 KB

english, 1992

6

Blood Pressure and Mood Responses in Hypertensive Patients on Antihypertensive Medications

Kathleen Potempa, Karen Babich, Sharon Fruh, Louis Fogg

Journal:

Journal of the American Academy of Nurse Practitioners

Year:

1993

Language:

english

File:

PDF, 922 KB

english, 1993

7

Foundation for the NIMH strategic plan for mood disorders research

Dennis S Charney, Karen S Babich

Journal:

Biological Psychiatry

Year:

2002

Language:

english

File:

PDF, 17 KB

english, 2002

8

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing

Mahorowala, Arpan P., Babich, Katherina, Petrillo, Karen E., Simons, John P., Angelopoulos, Marie, Patel, Vishnubhai, Grill, Alfred, Halle, Scott, Conti, Richard, Wu, ChungHsi J., Wise, Richard, Chen,

Year:

2001

Language:

english

File:

PDF, 880 KB

english, 2001

9

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Effects of underlayer on performance of bilayer resists for 248-nm lithography

Babich, Katherina, Callegari, Alessandro, Petrillo, Karen E., Simons, John P., LaTulipe, Douglas C., Angelopoulos, Marie, Lin, Qinghuang

Year:

1998

Language:

english

File:

PDF, 816 KB

english, 1998

10

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Extension of 248-nm optical lithography: a thin film imaging approach

Lin, Qinghuang, Katnani, Ahmad D., Brunner, Timothy A., DeWan, Charlotte, Fairchok, Cindy, LaTulipe, Douglas C., Simons, John P., Petrillo, Karen E., Babich, Katherina, Seeger, David E., Angelopoulos,

Year:

1998

Language:

english

File:

PDF, 3.19 MB

english, 1998

11

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Emerging Lithographic Technologies II - New family of non-chemically amplified resists

Aviram, Ari, Angelopoulos, Marie, Babich, Edward D., Babich, Inna V., Petrillo, Karen E., Seeger, David E., Vladimirsky, Yuli

Year:

1998

Language:

english

File:

PDF, 983 KB

english, 1998

12

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond

Pfeiffer, Dirk, Mahorowala, Arpan P., Babich, Katherina, Medeiros, David R., Petrillo, Karen E., Angelopoulos, Marie, Huang, Wu-Song, Halle, Scott, Brodsky, Colin, Allen, Scott D., Holmes, Steven J.,

Year:

2003

Language:

english

File:

PDF, 1.22 MB

english, 2003

13

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Silicon containing polymer in applications for 193 nm high NA lithography processes

Burns, Sean, Lin, Qinghuang, Pfeiffer, Dirk, Mahorowala, Arpan, Petrillo, Karen, Clancy, Alexandera, Babich, Katherina, Medeiros, David, Allen, Scott, Holmes, Steven, Crouse, Michael, Brodsky, Colin,

Year:

2006

Language:

english

File:

PDF, 634 KB

english, 2006

14

Responding to a Changed Reality in the Workplace

Journal:

Journal of the American Psychiatric Nurses Association

Year:

1995

File:

PDF, 378 KB

1995

15

Responding to a Changed Reality in the Workplace

Journal:

Journal of the American Psychiatric Nurses Association

Year:

1995

File:

PDF, 378 KB

1995

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